Electrochemical and photoelectrochemical study of the self‐assembled monolayer phytic acid on cupronickel B30
Abstract
Purpose
The purpose of this paper is to investigate the self‐assembled monolayers (SAMs) of phytic acid on cupronickel B30 surface of anticorrosion and inhibiting mechanisms.
Design/methodology/approach
Electrochemical and photocurrent response methods were performed to determine the effect of phytic acid SAMs on cupronickel B30.
Findings
The results indicated that phytic acid was liable to interact with B30 as a result of formation of complexes on B30 surface for anti‐rust and anti‐corrosion. The SAMs changed the structure of the electrochemical double layer and made the value of double layer capacitance decrease significantly. The B30 electrode showed p‐type photoresponse, which came from Cu2O layer on its surface. The photoresponse decreased greatly due to the SAMs of phytic acid as the corrosion resisting property was enhanced. This finding was in good agreement with the results obtained from EIS and polarization curves. Adsorption of phytic acid was found to follow the Langmuir adsorption isotherm and the adsorption mechanism was typical of chemisorption.
Originality/value
The SAMs of phytic acid on cupronickel B30 was gained for the first time. The photo‐electrochemical method was an in situ method, which was effective for characterizing optical and electronic properties of passive films.
Keywords
Citation
Xu, Q., Wan, Z., Zhou, G., Yin, R. and Cao, W. (2009), "Electrochemical and photoelectrochemical study of the self‐assembled monolayer phytic acid on cupronickel B30", Anti-Corrosion Methods and Materials, Vol. 56 No. 2, pp. 95-102. https://doi.org/10.1108/00035590910940087
Publisher
:Emerald Group Publishing Limited
Copyright © 2009, Emerald Group Publishing Limited