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Development and research of vacuum coating system in SL

Yiqing Wang (State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China)
Yucheng Ding (State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China)
Wanhua Zhao (State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China)
Zhongyun He (State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China)
Bingheng Lu (State Key Laboratory for Manufacturing Systems Engineering, Xi'an Jiaotong University, Xi'an, China)

Rapid Prototyping Journal

ISSN: 1355-2546

Article publication date: 5 October 2010

486

Abstract

Purpose

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The purpose of this paper is to show how to precisely control the liquid resin coating thickness in stereolithography (SL).

Design/methodology/approach

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A vacuum adsorption coating equipment and technology are developed to precisely control the liquid resin coating thickness in SL. Dual‐electrode device is used, so adsorption can be precisely controlled and the electrode polarization can be avoided.

Findings

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It turns out that the apparatus can control coating thickness effectively, and thickness uniformity is increased remarkably, which induces the standard deviation thickness decrease from 0.00547 to 0.00243 mm, and efficiency of rapid prototyping production increase by 53 percent.

Originality/value

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The paper demonstrates that the apparatus can control coating thickness effectively.

Keywords

Citation

Wang, Y., Ding, Y., Zhao, W., He, Z. and Lu, B. (2010), "Development and research of vacuum coating system in SL", Rapid Prototyping Journal, Vol. 16 No. 6, pp. 424-428. https://doi.org/10.1108/13552541011083344

Publisher

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Emerald Group Publishing Limited

Copyright © 2010, Emerald Group Publishing Limited

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