IMEC begins construction of 300 mm research lab

Citation

(2003), "IMEC begins construction of 300 mm research lab", Microelectronics International, Vol. 20 No. 2. https://doi.org/10.1108/mi.2003.21820bab.006

IMEC begins construction of 300 mm research lab

IMEC begins construction of 300 mm research lab

Based on a 2002 detailed engineering study and positive signals from the industry and local government to support IMEC's 300 mm silicon research platform initiative, IMEC's board of directors has today announced the construction of a new 300 mm clean room.

Construction of the new 2.200 m² research lab will begin in February 2003, with completion due in approximately 18 months. The facility is expected to go on-line in mid 2005, with activities gradually ramping up. The initiative involves an investment of 84 million euro of which 37.184 million euro has been granted by local government.

The new lab will be located adjacent to IMEC's existing facilities to ensure and optimize the exchange of information and to share common facilities, infrastructure and metrology tools.

IMEC will set up several research programs targeting the most important issues identified by the International Technology Roadmap for Semiconductors for the sub-45 nm node. The focus will be on EUV lithography, new materials, advanced devices and innovative interconnect schemes. The programs will be open for semiconductor companies and material and equipment suppliers worldwide.