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Hardness Measurements in a SEM as a Quality Test for Thin Films

H. Bangert (Technical University of Vienna, Vienna, Austria)
A. Kaminitschek (Technical University of Vienna, Vienna, Austria)
A. Wagendristel (Technical University of Vienna, Vienna, Austria)

Microelectronics International

ISSN: 1356-5362

Article publication date: 1 March 1986

68

Abstract

Hardness testing using a SEM offers visual observation and measurement according to the hardness definition even for submicroscopic impressions. It can provide information on plasticity, homogeneity, adhesion etc. which cannot be obtained from depth measurements alone. The device described operates inside a SEM and offers a load between 10−2N and 10−5N. The influence of test load, rate of load increase and dwell time on the results was examined on various materials.

Citation

Bangert, H., Kaminitschek, A. and Wagendristel, A. (1986), "Hardness Measurements in a SEM as a Quality Test for Thin Films", Microelectronics International, Vol. 3 No. 3, pp. 15-17. https://doi.org/10.1108/eb044241

Publisher

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MCB UP Ltd

Copyright © 1986, MCB UP Limited

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